Beitrag in einem Tagungsband
Terphenyl phosphanosilanes.



Details zur Publikation
Autor(inn)en:
Pietschnig, R.; Tirree, J.
Herausgeber:
Auner, Norbert; Weis, Johann
Verlag:
Wiley-VCH Verlag GmbH & Co. KGaA
Verlagsort / Veröffentlichungsort:
Weinheim
Publikationsjahr:
2005
Seitenbereich:
222-227
Buchtitel:
Organosilicon Chemistry VI
Abkürzung der Fachzeitschrift:
Organosilicon Chem. VI, [Eur. Silicon Days], 2nd
Bandnr.:
1
Jahrgang/Band:
1
Erste Seite:
222
Letzte Seite:
227

Zusammenfassung, Abstract
Investigations show that the presence of a terphenyl ligand increases the thermal stability of trisphosphanosilanes in soln. Nevertheless, std. work-up procedures induce condensation to Si-P rings and cages under elimination of PH3. The P-P and P-H coupling patterns in the 31P NMR spectra allow facile assignment of the major products to characteristic ring and cage structures in soln. Moreover, moderate heating leads to a rearrangement in which formally a silicon-carbon bond is broken and replaced by a phosphorus-carbon bond. This rearrangement might involve intermediates such as a terphenyl phosphasilyne. Generally, the increased acidity of phosphanyl groups adjacent to silane units leads to partial lithiation of the initially formed phosphanosilanes by the phosphanylating reagent LiPH2. However, alternative reagents to introduce phosphano groups lead to incomplete displacement of the fluorine atoms in the starting terphenyl trifluoro silane. [on SciFinder(R)]


Schlagwörter
terphenyl phosphanosilane prepn reactivity


Autor(inn)en / Herausgeber(innen)

Zuletzt aktualisiert 2019-29-01 um 14:50