Conference proceedings article
Terphenyl phosphanosilanes.



Publication Details
Authors:
Pietschnig, R.; Tirree, J.
Editor:
Auner, Norbert; Weis, Johann
Publisher:
Wiley-VCH Verlag GmbH & Co. KGaA
Place:
Weinheim
Publication year:
2005
Pages range:
222-227
Book title:
Organosilicon Chemistry VI
Journal acronym:
Organosilicon Chem. VI, [Eur. Silicon Days], 2nd
Number in series:
1
Volume number:
1
Start page:
222
End page:
227

Abstract
Investigations show that the presence of a terphenyl ligand increases the thermal stability of trisphosphanosilanes in soln. Nevertheless, std. work-up procedures induce condensation to Si-P rings and cages under elimination of PH3. The P-P and P-H coupling patterns in the 31P NMR spectra allow facile assignment of the major products to characteristic ring and cage structures in soln. Moreover, moderate heating leads to a rearrangement in which formally a silicon-carbon bond is broken and replaced by a phosphorus-carbon bond. This rearrangement might involve intermediates such as a terphenyl phosphasilyne. Generally, the increased acidity of phosphanyl groups adjacent to silane units leads to partial lithiation of the initially formed phosphanosilanes by the phosphanylating reagent LiPH2. However, alternative reagents to introduce phosphano groups lead to incomplete displacement of the fluorine atoms in the starting terphenyl trifluoro silane. [on SciFinder(R)]


Keywords
terphenyl phosphanosilane prepn reactivity


Authors/Editors

Last updated on 2019-29-01 at 14:50