Journal article
Deep single step vertical ICP--RIE etching of ion beam sputter deposited SiO2/Si multilayer stacks



Publication Details
Authors:
Messow, F.; Welch, C.; Eifert, A.; Ang, W.; Hoe, N.; Kusserow, T.; Hillmer, H.
Publication year:
2014
Journal:
Microelectronic Engineering
Pages range:
70-73
Volume number:
113
ISSN:
0167-9317



Keywords
ICP--RIE etching, Ion beam sputter deposition, SiO2/Si multilayer stack, Thin film

Last updated on 2019-24-07 at 08:55