Aufsatz in einer Fachzeitschrift
Artificial sub-μm magnetic patterning by He⁺ ion bombardment through a mask fabricated by Ultraviolet NanoImprint Lithography (UV-NIL)



Details zur Publikation
Autor(inn)en:
Schmidt, C.; Smolarczyk, M.; Gomer, L.; Hillmer, H.; Ehresmann, A.
Publikationsjahr:
2014
Zeitschrift:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Seitenbereich:
59-62
Jahrgang/Band:
322
ISSN:
0168-583X

Zusammenfassung, Abstract
Light-ion bombardment induced magnetic patterning (IBMP) is a smart method to tailor the unidirectional anisotropy in exchange-bias layer systems. If the bombardment area is limited by shadow masks, artificial magnetic patterns can be generated which are stable in remanence. A method is described where it is possible to fabricate submicron magnetic patterns over large sample areas: Ultraviolet NanoImprint Lithography (UV-NIL) in combination with IBMP. We show the fabrication of artificial magnetic patterns with dimensions between 400 and 1000nm over cm2 areas.


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Zuletzt aktualisiert 2019-25-07 um 13:13