Journal article
Artificial sub-μm magnetic patterning by He⁺ ion bombardment through a mask fabricated by Ultraviolet NanoImprint Lithography (UV-NIL)



Publication Details
Authors:
Schmidt, C.; Smolarczyk, M.; Gomer, L.; Hillmer, H.; Ehresmann, A.
Publication year:
2014
Journal:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Pages range:
59-62
Volume number:
322
ISSN:
0168-583X

Abstract
Light-ion bombardment induced magnetic patterning (IBMP) is a smart method to tailor the unidirectional anisotropy in exchange-bias layer systems. If the bombardment area is limited by shadow masks, artificial magnetic patterns can be generated which are stable in remanence. A method is described where it is possible to fabricate submicron magnetic patterns over large sample areas: Ultraviolet NanoImprint Lithography (UV-NIL) in combination with IBMP. We show the fabrication of artificial magnetic patterns with dimensions between 400 and 1000nm over cm2 areas.


Research Areas


Last updated on 2019-25-07 at 13:13