Journal article
Magnetization reversal of exchange bias double layers magnetically patterned by ion irradiation



Publication Details
Authors:
Fassbender, J.; Poppe, S.; Mewes, T.; Mougin, A.; Hillebrands, B.; Engel, D.; Jung, M.; Ehresmann, A.; Schmoranzer, H.; Faini, G.; Kirk, K.; Chapman, J.
Publication year:
2002
Journal:
Physica Status Solidi (A)
Pages range:
439-447
Volume number:
189
ISSN:
1862-6300

Abstract
He+ ion irradiation is an excellent tool to modify the magnitude and direction of the exchange bias field on the sub-micrometer scale without affecting the sample topography. This effect has been utilized to magnetically pattern NiFe/FeMn exchange bias double layers using resist masks patterned by electron beam lithography. Ion irradiation through the masks leads to a local modification of the magnetization reversal behavior and allows to study the magnetization reversal as a function of the exchange bias field strength and the pattern dimensions on a single sample. Results are presented on the macroscopic and microscopic magnetization reversal using the magneto-optic Kerr effect and Lorentz microscopy.


Research Areas


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