Aufsatz in einer Fachzeitschrift
Influence of ion bombardment induced patterning of exchange bias in pinned artificial ferrimagnets on the interlayer exchange coupling



Details zur Publikation
Autor(inn)en:
Höink, V.; Schmalhorst, J.; Reiss, G.; Weis, T.; Engel, D.; Ehresmann, A.; Lengemann, D.
Publikationsjahr:
2008
Zeitschrift:
Journal of Applied Physics
Seitenbereich:
123903
Jahrgang/Band:
103
ISSN:
0021-8979

Zusammenfassung, Abstract
Artificial ferrimagnets have many applications as, e.g., pinned reference electrodes in magnetic tunnel junctions. It is known that the application of ion bombardment (IB) induced patterning of the exchange bias coupling of a single layer reference electrode in magnetic tunnel junctions with He ions is possible. For applications as, e.g., special types of magnetic logic, a combination of the IB induced patterning of the exchange bias coupling and the implementation of an artificial ferrimagnet as reference electrode is desirable. Here, investigations for a pinned artificial ferrimagnet with a Ru interlayer, which is frequently used in magnetic tunnel junctions, are presented. It is shown that in this kind of samples the exchange bias can be increased or rotated by IB induced magnetic patterning with 10keV He ions without a destruction of the antiferromagnetic interlayer exchange coupling. An IrMn/Py/Co/Cu/Co stack turned out to be more sensitive to the influence of IB than the Ru based artificial ferrimagnet.


Forschungsfelder


Zuletzt aktualisiert 2019-01-11 um 16:04