Journal article
High-resolution photoemission studies at rough Cu(111) surfaces: the influence of defect scattering and disorder-dependent dephasing processes



Publication Details
Authors:
Theilmann, F.; Matzdorf, R.; Goldmann, A.
Publication year:
1999
Journal:
Surface Science
Pages range:
33-42
Volume number:
420
ISSN:
0039-6028



Keywords
angle-resolved photoemission, chemical vapour deposition, copper, electronic surface states, epitaxy, low-energy electron diffraction (SPALEED), low-index single crystal surfaces


Authors/Editors

Last updated on 2019-25-07 at 13:03