2017 | Taimoor, M., Alatawi, A., Reuter, S., Hillmer, H., Kusserow, T., 2017. Single-step inductively coupled plasma etching of sputtered Nb 2 O 5 /SiO 2 multilayer stacks using chromium etch mask. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35, TBD. https://doi.org/10.1116/1.4983683 |
2016 | Götte, N., Winkler, T., Meinl, T., Kusserow, T., Zielinski, B., Sarpe, C., Senftleben, A., Hillmer, H., Baumert, T., 2016. Temporal Airy pulses for controlled high aspect ratio nanomachining of dielectrics. Optica 3, 389–395. https://doi.org/10.1364/OPTICA.3.000389 |
2015 | Abdel-Awwad, M.A.H., Luan, H., Messow, F., Kusserow, T., Wiske, A., Siebert, A., Fuhrmann-Lieker, T., Salbeck, J., Hillmer, H., 2015. Optical amplification and photodegradation in films of spiro-quaterphenyl and its derivatives. Journal of Luminescence 159, 47–54. https://doi.org/10.1016/j.jlumin.2014.10.065 |
2015 | Götte, N., Kusserow, T., Winkler, T., Sarpe, C., Englert, L., Otto, D., Meinl, T., Khan, Y., Zielinski, B., Senftleben, A., Wollenhaupt, M., Hillmer, H., Baumert, T., 2015. Temporally shaped femtosecond laser pulses for creation of functional sub-100nm structures in dielectrics, in: König, K., Ostendorf, A. (Hrsg.), Optically Induced Nanostructures. De Gruyter, Berlin, S. 47 – 71. |
2014 | Messow, F., Welch, C., Eifert, A., Ang, W.C., Hoe, N.S., Kusserow, T., Hillmer, H., 2014. Deep single step vertical ICP--RIE etching of ion beam sputter deposited SiO2/Si multilayer stacks. Microelectronic Engineering 113, 70–73. https://doi.org/10.1016/j.mee.2013.07.018 |
2012 | Kusserow, T., Wulf, M., Zamora, R., Kanwar, K., Hillmer, H., 2012. Processing of photonic crystals in InP membranes by focused ion beam milling and plasma etching. Microelectronic Engineering -. https://doi.org/10.1016/j.mee.2012.02.019 |
2012 | |
