Prof. Dr. rer. nat. habil. Hartmut Hillmer
Projektleitung
2018 - 2020 | |
04/2012 - 03/2015 | |
11/2008 - 04/2012 | |
09/2008 - 09/2011 | |
05/2008 - 10/2013 | |
04/2008 - 03/2011 | |
12/2007 - 08/2008 | |
10/2007 - 03/2008 | |
01/2007 - 12/2007 | |
08/2006 - 05/2009 | |
Publikationen
2018 | Ha, U.-M., Kaban, B., Tomita, A.-I., Krekic, K., Klintuch, D., Pietschnig, R., Ehresmann, A., Holzinger, D., Hillmer, H., 2018. Multifunctional guest-host particles engineered by reversal nanoimprint lithography. Applied Nanoscience 1–9. https://doi.org/10.1007/s13204-018-0719-7 |
2018 | Hillmer, H., Al-Qargholi, B., Khan, M.M., Worapattrakul, N., Wilke, H., Woidt, C., Tatzel, A., 2018. Optical MEMS-based micromirror arrays for active light steering in smart windows. Japanese Journal of Applied Physics 57, 08PA07. https://doi.org/10.7567/JJAP.57.08PA07 |
2018 | Letnev, J., Hazenbiller, W., Osipowicz, A., Beglarian, A., Bouquet, H., Drexlin, G., Glück, F.-X., Garbe, J., Hillmer, H., Marte, P., Thümmler, T., Weinheimer, C., 2018. Technical design and commissioning of a sensor net for fine-meshed measuring of the magnetic field at the KATRIN spectrometer. Journal of Instrumentation 13, 8010. https://doi.org/10.1088/1748-0221/13/08/T08010 |
2017 | Taimoor, M., Alatawi, A., Reuter, S., Hillmer, H., Kusserow, T., 2017. Single-step inductively coupled plasma etching of sputtered Nb 2 O 5 /SiO 2 multilayer stacks using chromium etch mask. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35, TBD. https://doi.org/10.1116/1.4983683 |
2016 | Götte, N., Winkler, T., Meinl, T., Kusserow, T., Zielinski, B., Sarpe, C., Senftleben, A., Hillmer, H., Baumert, T., 2016. Temporal Airy pulses for controlled high aspect ratio nanomachining of dielectrics. Optica 3, 389–395. https://doi.org/10.1364/OPTICA.3.000389 |
2015 | Abdel-Awwad, M.A.H., Luan, H., Messow, F., Kusserow, T., Wiske, A., Siebert, A., Fuhrmann-Lieker, T., Salbeck, J., Hillmer, H., 2015. Optical amplification and photodegradation in films of spiro-quaterphenyl and its derivatives. Journal of Luminescence 159, 47–54. https://doi.org/10.1016/j.jlumin.2014.10.065 |
2015 | Fuhrmann-Lieker, T., Lambrecht, J., Hoinka, N.M., Kiurski, M., Wiske, A., Hagelstein, G., Yurttagül, N., Abdel-Awwad, M.A.H., Messow, F., Hillmer, H., Salbeck, J., 2015. Optical amplification and stability of spiroquaterphenyl compounds and blends. Journal of the European Optical Society-Rapid Publications 10, 15007. https://doi.org/10.2971/jeos.2015.15007 |
2015 | Götte, N., Kusserow, T., Winkler, T., Sarpe, C., Englert, L., Otto, D., Meinl, T., Khan, Y., Zielinski, B., Senftleben, A., Wollenhaupt, M., Hillmer, H., Baumert, T., 2015. Temporally shaped femtosecond laser pulses for creation of functional sub-100nm structures in dielectrics, in: König, K., Ostendorf, A. (Hrsg.), Optically Induced Nanostructures. De Gruyter, Berlin, S. 47 – 71. |
2014 | Schmidt, C., Smolarczyk, M.A., Gomer, L., Hillmer, H., Ehresmann, A., 2014. Artificial sub-μm magnetic patterning by He+ ion bombardment through a mask fabricated by Ultraviolet NanoImprint Lithography (UV-NIL). Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 322, 59–62. https://doi.org/10.1016/j.nimb.2014.01.005 |
2014 | Messow, F., Welch, C., Eifert, A., Ang, W.C., Hoe, N.S., Kusserow, T., Hillmer, H., 2014. Deep single step vertical ICP--RIE etching of ion beam sputter deposited SiO2/Si multilayer stacks. Microelectronic Engineering 113, 70–73. https://doi.org/10.1016/j.mee.2013.07.018 |
Weitere Forschungsaktivitäten
