Deep single step vertical ICP--RIE etching of ion beam sputter deposited SiO2/Si multilayer stacks - Forschungsinformationssystem | Universität Kassel

Journal article

Deep single step vertical ICP--RIE etching of ion beam sputter deposited SiO2/Si multilayer stacks

Publication Details

Authors:

Messow, F.; Welch, C.; Eifert, A.; Ang, W.; Hoe, N.; Kusserow, T.; Hillmer, H.

Publication year:

2014

Journal:

Microelectronic Engineering

Pages range :

70-73

Volume number:

113

ISSN:

0167-9317

URN / URL:

Keywords

ICP--RIE etching, Ion beam sputter deposition, SiO2/Si multilayer stack, Thin film

Authors/Editors