Journal article
High-resolution photoemission studies at rough Cu(111) surfaces: the influence of defect scattering and disorder-dependent dephasing processes
Publication Details
Authors: | Theilmann, F.; Matzdorf, R.; Goldmann, A. |
Publication year: | 1999 |
Journal: | Surface Science |
Pages range : | 33-42 |
Volume number: | 420 |
ISSN: | 0039-6028 |
DOI-Link der Erstveröffentlichung: |
Keywords
angle-resolved photoemission, chemical vapour deposition, copper, electronic surface states, epitaxy, low-energy electron diffraction (SPALEED), low-index single crystal surfaces
