Aufsatz in einer Fachzeitschrift
Plasma ion source for in situ ion bombardment in a soft x-ray magnetic scattering diffractometer
Details zur Publikation
Autor(inn)en: | Lengemann, D.; Engel, D.; Ehresmann, A. |
Publikationsjahr: | 2012 |
Zeitschrift: | Review of Scientific Instruments |
Seitenbereich: | 053303 |
Jahrgang/Band : | 83 |
ISSN: | 0034-6748 |
eISSN: | 1089-7623 |
DOI-Link der Erstveröffentlichung: |
URN / URL: |
Zusammenfassung, Abstract
A new plasma ion source for in situ keV He ion bombardment of solid state samples or thin films was designed and built for ion fluences between 1 × 1012 and 1 × 1017 ions/cm2. The system was designed to be mounted to different diffraction chambers for soft x-ray resonant magnetic scattering. Without breaking the vacuum due to He-ion bombardment, structural and magnetic modifications of the samples can be studied in situ and element specifically.
A new plasma ion source for in situ keV He ion bombardment of solid state samples or thin films was designed and built for ion fluences between 1 × 1012 and 1 × 1017 ions/cm2. The system was designed to be mounted to different diffraction chambers for soft x-ray resonant magnetic scattering. Without breaking the vacuum due to He-ion bombardment, structural and magnetic modifications of the samples can be studied in situ and element specifically.
