Journal article
Single-step inductively coupled plasma etching of sputtered Nb 2 O 5 /SiO 2 multilayer stacks using chromium etch mask
Publication Details
Authors: | Taimoor, M.; Alatawi, A.; Reuter, S.; Hillmer, H.; Kusserow, T. |
Publication year: | 2017 |
Pages range : | TBD |
Volume number: | 35 |
Issue number: | 4 |
